A paper about phonon transport in SiGe-based nano-system with nanodot by Tatsuhiko Taniguchi was published by Nanoscale.
This is collaborative research between Nakamura Lab. and Sanada Lab. in Osaka University.
“Phonon transport in nano-system of Si and SiGe films with Ge nanodots and approach to ultralow thermal conductivity”
Nanoscale 13, 4971-4977 (2021). DOI: 10.1039/D0NR08499A