A paper about the metastable 2H-CaSi2 films was published by Applied Physics Express (IF=2.819). This is a result by collaborative research with Toyota central R and D Labs. Congratulations!

“Growth of metastable 2H-CaSi2 films on Si (111) substrates with ultrathin SiO2 films by solid phase epitaxy”

DOI: https://doi.org/10.35848/1882-0786/ad0e24